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Results 1 to 25 of 284

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Fabrication technology of SiGe hetero-structures and their propertiesSHIRAKI, Yasuhiro; SAKAI, Akira.Surface science reports. 2005, Vol 59, Num 7-8, pp 153-207, issn 0167-5729, 55 p.Article

Highly luminescent cubic GaN microcrystals grown on GaAs(001) substrates by RF-MBEKATAYANAA, Ryuji; ONABE, Kentaro; SHIRAKI, Yasuhiro et al.Physica status solidi. B. Basic research. 2004, Vol 241, Num 12, pp 2739-2743, issn 0370-1972, 5 p.Conference Paper

Built-in electric field at cubic GaN/GaAs(001) heterointerfaces investigated by phase-selected photoreflectance excitationKATAYAMA, Ryuji; ONABE, Kentaro; SHIRAKI, Yasuhiro et al.Physica status solidi. B. Basic research. 2004, Vol 241, Num 12, pp 2749-2753, issn 0370-1972, 5 p.Conference Paper

Observation of band alignment transition from type-I to type-II in AlInAs/AlGaAs self-assembled quantum dotsOHDAIRA, Keisuke; MURATA, Hiroshi; KOH, Shinji et al.Journal of the Physical Society of Japan. 2003, Vol 72, Num 12, pp 3271-3275, issn 0031-9015, 5 p.Article

Silicon Photonic Devices with Ge Quantum Dots as Light SourcesSHIRAKI, Yasuhiro; KAWAGUCHI, Kenji; XIA, Jinsong et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 67750Q.1-67750Q.6, issn 0277-786X, isbn 978-0-8194-6935-9, 1VolConference Paper

Magneto-photoluminescence studies of AIInAs/AlGaAs self-assembled quantum dots with type-II band alignmentOHDAIRA, Keisuke; ONO, Kazuo; UCHIDA, Kazuhito et al.Journal of the Physical Society of Japan. 2004, Vol 73, Num 2, pp 480-484, issn 0031-9015, 5 p.Article

GaAs/Ge/GaAs sublattice reversal epitaxy and its application to nonlinear optical devicesKOH, Shinji; KONDO, Takashi; SHIRAKI, Yasuhiro et al.Journal of crystal growth. 2001, Vol 227-28, pp 183-192, issn 0022-0248Conference Paper

Metalorganic vapor-phase epitaxy of cubic GaN on GaAs (1 0 0) substrates by inserting an intermediate protection layerJUN WU; FANGHAI ZHAO; ONABE, Kentaro et al.Journal of crystal growth. 2000, Vol 221, pp 276-279, issn 0022-0248Conference Paper

Enhancement of light emission from Ge quantum dots by photonic crystal nanocavities at room-temperatureXUEJUN XU; USAMI, Noritaka; MARUIZUMI, Takuya et al.Journal of crystal growth. 2013, Vol 378, pp 636-639, issn 0022-0248, 4 p.Conference Paper

Al growth on Si(111)(√3×√3)-Ga surfaces at room temperatureMAEHASHI, K; KATSUKI, H; NAKASHIMA, H et al.Japanese journal of applied physics. 1995, Vol 34, Num 2B, pp 997-1000, issn 0021-4922, 1Conference Paper

Characterization of deep levels in Si-doped InxAl1-xAs layers grown by molecular beam epitaxyMALININ, A; TOMOZAWA, H; HASHIZUME, T et al.Japanese journal of applied physics. 1995, Vol 34, Num 2B, pp 1138-1142, issn 0021-4922, 1Conference Paper

Control of As precipitation in low-temperature GaAs by electronic and isoelectronic delta dopingTZYY MING CHENG; CHUN YEN CHANG; JIN HUA HUANG et al.Japanese journal of applied physics. 1995, Vol 34, Num 2B, pp 1185-1189, issn 0021-4922, 1Conference Paper

Counter doped N-channel MOSFETs: mobility improvement and reverse short channel effect enhancementPLOEG, E. P. V; NODA, H; UMEDA, K et al.Japanese journal of applied physics. 1995, Vol 34, Num 2B, pp 878-881, issn 0021-4922, 1Conference Paper

Disordering of CdZnSe/ZnSe strained layer superlattices by ion implantationYOKOGAWA, T; MERZ, J; LUO, H et al.Japanese journal of applied physics. 1995, Vol 34, Num 2B, pp 1159-1161, issn 0021-4922, 1Conference Paper

Elastic scattering and depletion effects on current-voltage characteristics of gated resonant tunneling diodesLEE, C.Japanese journal of applied physics. 1995, Vol 34, Num 2B, pp 1236-1240, issn 0021-4922, 1Conference Paper

Electroluminescence of ballistic and phonon emitting electrons in the p-type base of AlGaAs/GaAs HBT structuresFUKAI, Y. K; FURUTA, T; ISHIBASHI, T et al.Japanese journal of applied physics. 1995, Vol 34, Num 2B, pp 1208-1212, issn 0021-4922, 1Conference Paper

Electron beam patterning mechanism of GaAs oxide mask layers used in in situ electron beam lithographyTANAKA, N; LOPEZ, M; MATSUYAMA, I et al.Japanese journal of applied physics. 1995, Vol 34, Num 2B, pp 1194-1198, issn 0021-4922, 1Conference Paper

Extremely high selective etching of porous Si for single etch-stop bond-and-etch-back silicon-on-insulatorSAKAGUCHI, K; SATO, N; YAMAGATA, K et al.Japanese journal of applied physics. 1995, Vol 34, Num 2B, pp 842-847, issn 0021-4922, 1Conference Paper

H2O2 decomposition and its impact on silicon surface roughening and gate oxide integritySCHMIDT, H. F; MEURIS, M; MERTENS, P. W et al.Japanese journal of applied physics. 1995, Vol 34, Num 2B, pp 727-731, issn 0021-4922, 1Conference Paper

Low temperature chemical vapor deposition of high quality SiO2 film using helicon plasma sourceNISHIMOTO, Y; TOKUMASU, N; MAEDA, K et al.Japanese journal of applied physics. 1995, Vol 34, Num 2B, pp 762-766, issn 0021-4922, 1Conference Paper

Metalorganic vapor phase epitaxy growth of Be-doped InP using bismethylcyclopentadienyl-beryliumKIMURA, T; ISHIDA, T; SONODA, T et al.Japanese journal of applied physics. 1995, Vol 34, Num 2B, pp 1106-1108, issn 0021-4922, 1Conference Paper

New P-MOSFET hot-carrier degradation model for bi-directional operationSHIMIZU, S; TANIZAWA, M; KUSUNOKI, S et al.Japanese journal of applied physics. 1995, Vol 34, Num 2B, pp 889-894, issn 0021-4922, 1Conference Paper

Numerical prediction for 2 GHz RF amplifier of SOI power MOSFETOMURA, I; NAKAGAWA, A.Japanese journal of applied physics. 1995, Vol 34, Num 2B, pp 827-830, issn 0021-4922, 1Conference Paper

Photoluminescence from a silicon quantum well formed on separation by implanted oxygen substrateTAKAHASHI, Y; FURUTA, T; ONO, Y et al.Japanese journal of applied physics. 1995, Vol 34, Num 2B, pp 950-954, issn 0021-4922, 1Conference Paper

Suppression of leakage current in n-channel polysilicon thin-film transistors using NH3 annealingDEUK-SUNG CHOI; SUNG-HOI HUR; GI-YOUNG YANG et al.Japanese journal of applied physics. 1995, Vol 34, Num 2B, pp 882-885, issn 0021-4922, 1Conference Paper

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